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Semiconductor Ozone Solutions was founded to provide economical solutions for the infusion of various chemical or inert gasses into De-ionized ultra pure water for Semiconductor IC and Solar Cell manufacturing industries. Ozone and Carbon Dioxide Infusion into De-Ionized water has been accomplished successfully for more then a decade. However, efficiency and cost remained a constant problem requiring new materials and methods to overcome. Semiconductor Ozone Solutions has applied more then 30 years of wet process, mechanical engineering and ultra pure plastic machining experience to produce a wide variety of modern products utilizing the newest, most cost effective manufacturing materials and methods. With a complete line of Natural Poly, PVDF, Halar, PTFE and PFA solutions, S.O.S has the right solution at the right price for your applications. Request Quote Email sales@ozoneinfusion.com
New and Used Ozone Generators and Analyzers
CO2 Infusion System for FSI & SEZ Tools
DIO3 Cabinet
S.O.S will not only provide the right infuser for your application but also the technical knowledge required for its successful installation and utilization. All our products are available with pressure imbalance protection sensors and components installed which ensure your purchase will operate trouble free immediately upon installation and reliably well into the future. Installation Documentation, Schematic installation examples and technical specifications required for proper operation are included with each purchase. Call for assistance and we will connect you to the right technical solution and materials of construction custom sized to your tanks at prices that fit your development or maintenance budgets
DIO3 Injection System and ODS
- Nitrogen Agitation in Static Tanks for Consistent Process Results
- Agitation to Produce Extrinsic Bubbles in HF/Nitric Etchants to Improve Uniformity Issues Caused by HF/Nitric Bubbles Masking the Etch on the Surface
- FeOL DI Water Static Charge Elimination
- FeOL Wafer Surface Conversion from Hydrophobic to Hydrophilic
- FeOL Growing Consistent Oxide Layers for Improved Gate Performance
- FeOL DIO3 Ashed Photoresist Residue Removal
- FeOL DIO3 Cleaning Process for Removal of Organics
- FeOL Chemical Injection of HCL Gas to Remove Metals
- FeOL HCL Ozone Wafer Reclaim Metal Strip
- EDTA NaOH Glacial CH3OOH Nitrogen Injection to inhibit CO2 and O2 absorption into the EDTA solution
- BeOL Elimination of Corrosion on Aluminum Pads or Traces in by Controlling PH Swings in DI Rinse Tanks after Processing Wafers in Alkaline based Solvents
Email sales@ozoneinfusion.com